The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2022

Filed:

Feb. 27, 2018
Applicant:

Nova Ltd., Rehovot, IL;

Inventor:

Igor Turovets, Moshav Giv'at Ye'arim, IL;

Assignee:

NOVA LTD, Rehovot, IL;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G01B 11/06 (2006.01); G01B 11/26 (2006.01); G01N 21/47 (2006.01); G01R 31/28 (2006.01); G11C 29/38 (2006.01);
U.S. Cl.
CPC ...
H01L 22/34 (2013.01); G01B 11/06 (2013.01); G01B 11/26 (2013.01); G01N 21/47 (2013.01); G01R 31/2884 (2013.01); G11C 29/38 (2013.01); H01L 22/12 (2013.01); H01L 22/14 (2013.01);
Abstract

A test site and method are herein disclosed for predicting E-test structure (in-die structure) and/or device performance. The test site comprises an E-test structure and OCD-compatible multiple structures in the vicinity of the E-test structure to allow optical scatterometry (OCD) measurements. The OCD-compatible multiple structures are modified by at least one modification technique selected from (a) multiplication type modification technique, (b) dummification type modification technique, (c) special Target design type modification technique, and (d) at least one combination of (a), (b) and (c) for having a performance equivalent to the performance of the E-test structure.


Find Patent Forward Citations

Loading…