The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2022

Filed:

Mar. 08, 2021
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Bryant Mantiply, Mountain View, CA (US);

Xiumei Liu, Fremont, CA (US);

Matthew Giusti, Portland, OR (US);

Kai Cao, Fremont, CA (US);

Richard Wallingford, Ames, IA (US);

Assignee:

KLA Corp., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/232 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
H04N 5/232125 (2018.08); G06T 7/0004 (2013.01); G06T 2207/10148 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Methods and systems for determining focus settings for use in a specimen scan are provided. One method includes generating a focus map defined as values of best focus as a function of position on a specimen using output generated in one or more pre-focus swaths scanned on the specimen by an output acquisition subsystem configured to direct energy to a specimen, to detect energy from the specimen, and to generate output responsive to the detected energy. The method also includes interpolating the focus map to generate focus settings for a scan performed on the specimen during a process and storing information for the generated focus settings for use in the scan performed on the specimen during the process.


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