The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Nov. 20, 2020
Fei Company, Hillsboro, OR (US);
Herman Carlo Floresca, Frisco, TX (US);
Brian Tilley, Richardson, TX (US);
FEI Company, Hillsboro, OR (US);
Abstract
Apparatus and methods are disclosed for particle beam focusing, suitable for use in sample preparation or test environments, including SEM-based nanoprobing platforms. With a particle beam incident on a sample surface, stage current is used as an indicator of spot size. By scanning or searching settings of a working distance control, a control value having maximum (or minimum) stage current is used to set the beam waist at the sample surface. Alternatively, minima (or maxima) of reflected current can be used. Stigmator controls can be adjusted similarly to reduce astigmatism. The scan of control settings can be performed concurrently with sweeping the beam across a region of interest on the sample. Curved sweep patterns can be used. Energy measurements can be used as an alternative to current measurement. Applications to a nanoprobing workflow are disclosed.