The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
Dec. 15, 2020
International Business Machines Corporation, Armonk, NY (US);
Dureseti Chidambarrao, Weston, CT (US);
David Wolpert, Poughkeepsie, NY (US);
Atsushi Ogino, Fishkill, NY (US);
Matthew T. Guzowski, Essex Junction, VT (US);
Steven Paul Ostrander, Poughkeepsie, NY (US);
Tuhin Sinha, Oradell, NJ (US);
Michael Stewart Gray, Fairfax, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A structure including a plurality of dielectric regions is described. The structure can include a rivet cell. The rivet cell can include a set of stacked vias. The rivet cell can extend through a stress hotspot of the structure. A length of the rivet cell can thread through at least one dielectric region among the plurality of dielectric regions. The rivet cell can be among a number of rivet cells inserted in the stress hotspot. The stress hotspot can be among a plurality of stress hotspots across the structure. A length of the rivet cell can be based on a model of a relationship between the length of the rivet cell and an energy release rate of the structure. The rivet cell can thread through an interface between a first dielectric region and a second dielectric region having different dielectric constants.