The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2022

Filed:

Apr. 05, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Takahiro Nishihata, Tokyo, JP;

Mayuka Osaki, Tokyo, JP;

Takuma Yamamoto, Tokyo, JP;

Akira Hamaguchi, Tokyo, JP;

Yusuke Iida, Tokyo, JP;

Chihiro Ida, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); G06T 7/70 (2017.01); G01N 23/203 (2006.01); H01J 37/244 (2006.01); G06T 7/00 (2017.01); G06T 11/00 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G01N 23/203 (2013.01); G06T 7/0002 (2013.01); G06T 7/70 (2017.01); G06T 11/00 (2013.01); H01J 37/244 (2013.01); H01J 37/26 (2013.01); G01N 2223/053 (2013.01); G01N 2223/401 (2013.01); G01N 2223/505 (2013.01); G01N 2223/611 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30168 (2013.01); H01J 2237/2445 (2013.01);
Abstract

An electron microscope apparatus includes a detection unit that detects reflected electrons reflected from a sample when the sample is irradiated with primary electrons emitted by a primary electron generation unit (electron gun), an image generation unit that generates an image of a surface of the sample with the reflected electrons based on output from the detection unit, and a processing unit that generates a differential waveform signal of the image generated by the image generation unit, processes the image by using information of the differential waveform signal, and measures a dimension of a pattern formed on the sample.


Find Patent Forward Citations

Loading…