The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 05, 2022

Filed:

Dec. 05, 2019
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hiroshi Yoshida, Kumamoto, JP;

Takahiro Kawazu, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/306 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67086 (2013.01); H01L 21/30604 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 22/12 (2013.01);
Abstract

A substrate processing method includes generating a plurality of records each including a piece of recipe information in a substrate processing in association with control value information of a control target in the substrate processing, storing the plurality of records generated in the generating, acquiring recipe information input by an operator when performing the substrate processing, reading a record including recipe information identical to the recipe information acquired in the acquiring, and controlling the control target based on the control value information in the recipe information of the record read in the reading.


Find Patent Forward Citations

Yoshida, Hiroshi. (2022). Substrate processing method and substrate processing apparatus (U.S. Patent No. 11295966). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11295966

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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