The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Jun. 23, 2021
Applicant:
Senic Inc., Seoul, KR;
Inventors:
Jong Hwi Park, Suwon-si, KR;
Kap-Ryeol Ku, Suwon-si, KR;
Sang Ki Ko, Suwon-si, KR;
Jung-Gyu Kim, Suwon-si, KR;
Byung Kyu Jang, Suwon-si, KR;
Jung Woo Choi, Suwon-si, KR;
Myung-Ok Kyun, Suwon-si, KR;
Jongmin Shim, Hwaseong-si, KR;
Assignee:
SENIC INC., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 29/16 (2006.01); H01L 21/66 (2006.01); H01L 21/02 (2006.01); G01N 23/207 (2018.01);
U.S. Cl.
CPC ...
H01L 29/1608 (2013.01); G01N 23/207 (2013.01); H01L 21/02529 (2013.01); H01L 22/12 (2013.01);
Abstract
The wafer having a retardation distribution measured with a light having a wavelength of 520 nm, wherein an average value of the retardation is 38 nm or less, wherein the wafer comprises a micropipe, and wherein a density of the micropipe is 1.5/cmor less, is disclosed.