The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Mar. 17, 2020
Applicant:
Western Digital Technologies, Inc., San Jose, CA (US);
Inventors:
Assignee:
Western Digital Technologies, Inc., San Jose, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/31 (2006.01); H01L 25/065 (2006.01); H01L 21/50 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 23/3142 (2013.01); H01L 21/50 (2013.01); H01L 21/67011 (2013.01); H01L 23/31 (2013.01); H01L 25/0657 (2013.01);
Abstract
A process includes forming one or more apertures on a component backside, creating a vacuum in a mold chase, and engaging the component backside with a mold compound in the mold chase. The one or more apertures form an aperture structure. The aperture structure may include multiple apertures parallel or orthogonal to each other. The apertures have an aperture width, aperture depth, and aperture pitch. These characteristics may be altered to minimize the likelihood of trapped air remaining after creating the vacuum in the mold chase.