The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
May. 20, 2019
Asml Netherlands B.v., Veldhoven, NL;
Jeroen Van Dongen, Houten, NL;
Wim Tjibbo Tel, Helmond, NL;
Sarathi Roy, Eindhoven, NL;
Yichen Zhang, Eindhoven, NL;
Andrea Cavalli, Eindhoven, NL;
Bart Laurens Sjenitzer, Eindhoven, NL;
Simon Philip Spencer Hastings, San Jose, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of determining a sampling control scheme and/or a processing control scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a sampling and/or processing control scheme is generated using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. Also, there is provided a method of determining which of multiple devices contributed to a fingerprint of a processing parameter.