The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2022

Filed:

May. 24, 2019
Applicant:

Onto Innovation Inc., Wilmington, MA (US);

Inventors:

Paul A. Doyle, Milpitas, CA (US);

Mark James Franceschi, Millbrae, CA (US);

Morgan A. Crouch, Hillsboro, OR (US);

Kenneth E. James, Morgan Hill, CA (US);

Assignee:

Onto Innovation Inc., Wilmington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16F 15/02 (2006.01); F16F 15/027 (2006.01); F16F 7/10 (2006.01); G01N 21/95 (2006.01); F16F 9/53 (2006.01); F16F 7/116 (2006.01);
U.S. Cl.
CPC ...
F16F 15/027 (2013.01); F16F 7/1017 (2013.01); F16F 7/116 (2013.01); F16F 9/532 (2013.01); F16F 9/535 (2013.01); G01N 21/9501 (2013.01);
Abstract

A damper for a semiconductor metrology or inspection system includes a pair of parallel plates with a fluid with a variable viscosity retained between plates. At least one wire is disposed between the plates, which may include one or more sets of lands and grooves. In some implementations, both plates include intermeshed lands and grooves. A controller is configured to provide a current to the at least one wire in order to adjust an electromagnetic field or a current through the fluid. The fluid may be a magnetorheological fluid or an electrorheological fluid in which the viscosity of the fluid is variable based on the electromagnetic field or current through the fluid. The controller varies the current applied to the wire to adjust the viscosity of the fluid to alter the damping of the semiconductor metrology or inspection system based on movement of the stage.


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