The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2022
Filed:
Dec. 22, 2020
Applied Materials Israel Ltd., Rehovot, IL;
Yosef Basson, Mazkeret-Batya, IL;
Yuri Belenky, Be'er-Ya'akov, IL;
Mordechai Rozen, Rishon-LeZion, IL;
Lior Klein, Ramat-Gan, IL;
Asaf Grosz, Ramat-Gan, IL;
APPLIED MATERIALS ISRAEL LTD., Rehovot, IL;
BAR ILAN UNIVERSITY, Ramat Gan, IL;
B.G. NeaevTechnoloaies and Apolications Ltd., Beer-Sheva, IL;
Abstract
A method, a non-transitory computer readable medium and a system for compensating for an electromagnetic interference induced deviation of an electron beam. The method may include obtaining measurement information about a magnetic field within an electron beam tool, the measurement information is generated by at least one planar Hall Effect magnetic sensor that is located within the electron beam tool; wherein the at least one planar Hall Effect magnetic sensor comprises at least one magnetometer integrated with at least one magnetic flux concentrator; estimating the electromagnetic interference induced deviation of the electron beam, the estimating is based on the magnetic field; and setting a trajectory of the electron beam to compensate for the electromagnetic interference induced deviation of the electron beam.