The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Dec. 07, 2020
Bruker Nano Gmbh, Berlin, DE;
Thomas Schwager, Berlin, DE;
Daniel Radu Goran, Berlin, DE;
BRUKER NANO GMBH, Berlin, DE;
Abstract
The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern () of a sample () in an electron microscope () comprising at least one active electron lens () focusing an electron beam () in z-direction on a sample () positioned in distance D below the electron lens (), the detected TKD () pattern comprising a plurality of image points x, yand mapping each of the detected image points x, yto an image point of an improved TKD pattern () with the coordinates x, yby using and inverting generalized terms of the form x=γ*A+(1−γ)*B and y=γ*C+(1−γ)*D wherein with Z being an extension in the z-direction of a cylindrically symmetric magnetic field Bof the electron lens (), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x, y, with B and D defining a rotation around a symmetry axis of the magnetic field B, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field B. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.