The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2022

Filed:

Jun. 01, 2020
Applicant:

Yangtze Memory Technologies Co., Ltd., Wuhan, CN;

Inventors:

Cheng Gan, Wuhan, CN;

Wei Liu, Wuhan, CN;

Shi Qi Huang, Wuhan, CN;

Shunfu Chen, Wuhan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 16/08 (2006.01); G11C 8/08 (2006.01); H01L 27/11556 (2017.01); H01L 27/11582 (2017.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
G11C 16/08 (2013.01); G11C 8/08 (2013.01); H01L 27/11556 (2013.01); H01L 27/11582 (2013.01); H01L 29/0649 (2013.01);
Abstract

Local word line driver device, memory device, and fabrication method are provided. A local word line driver device includes a substrate and an array of transistor structures formed on the substrate. The transistor structures are configured in rows and columns. The substrate includes a plurality of first field regions each between adjacent rows of the transistor structures, and a plurality of second field regions each between adjacent columns of the transistor structures. A deep trench isolation structure is formed in at least one field region of: the plurality of first field regions or the plurality of second field regions, of the substrate.


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