The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Jun. 19, 2019
Applicant:

Stmicroelectronics, Inc., Coppell, TX (US);

Inventors:

Nicolas Loubet, Guilderland, NY (US);

Pierre Morin, Kessel-Lo, BG;

Yann Mignot, Slingerlands, NY (US);

Assignee:

STMicroelectronics, Inc., Coppell, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 21/8238 (2006.01); H01L 27/092 (2006.01); H01L 29/165 (2006.01); H01L 21/02 (2006.01); H01L 21/762 (2006.01); H01L 29/49 (2006.01); H01L 29/06 (2006.01); H01L 29/417 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823821 (2013.01); H01L 21/02381 (2013.01); H01L 21/02532 (2013.01); H01L 21/76224 (2013.01); H01L 21/823807 (2013.01); H01L 21/823878 (2013.01); H01L 27/0922 (2013.01); H01L 27/0924 (2013.01); H01L 29/0649 (2013.01); H01L 29/165 (2013.01); H01L 29/41791 (2013.01); H01L 29/4916 (2013.01); H01L 29/785 (2013.01); H01L 29/7842 (2013.01);
Abstract

Integrated circuits are disclosed in which the strain properties of adjacent pFETs and nFETs are independently adjustable. The pFETs include compressive-strained SiGe on a silicon substrate, while the nFETs include tensile-strained silicon on a strain-relaxed SiGe substrate. Adjacent n-type and p-type FinFETs are separated by electrically insulating regions formed by a damascene process. During formation of the insulating regions, the SiGe substrate supporting the n-type devices is permitted to relax elastically, thereby limiting defect formation in the crystal lattice of the SiGe substrate.


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