The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
Dec. 27, 2019
Applicant:
Intel Corporation, Santa Clara, CA (US);
Inventors:
Lauren Doyle, Portland, OR (US);
Marie Krysak, Portland, OR (US);
Patrick Theofanis, Pasadena, CA (US);
James Blackwell, Portland, OR (US);
Eungnak Han, Portland, OR (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08G 83/00 (2006.01); C08F 20/24 (2006.01); C08F 30/08 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C08F 20/24 (2013.01); C08F 30/08 (2013.01); C08G 83/003 (2013.01); C08G 83/005 (2013.01); G03F 7/2004 (2013.01);
Abstract
Chain scission resist compositions suitable for EUV lithography applications may include monomer functional groups that improve the kinetics and/or thermodynamics of the scission mechanism. Chain scission resists may include monomer functional groups that reduce the risk that leaving groups generated through the scission mechanism may chemically corrode processing equipment.