The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2022
Filed:
May. 14, 2018
Applicant:
Globalfoundries U.s. Inc., Santa Clara, CA (US);
Inventor:
Nan Wu, Dresden, DE;
Assignee:
GlobalFoundries U.S. Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H01L 21/475 (2006.01); H01L 27/11 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0274 (2013.01); H01L 21/28141 (2013.01); H01L 21/475 (2013.01); H01L 27/1104 (2013.01);
Abstract
The present disclosure provides manufacturing techniques in which the layout pattern of a RAM cell may be obtained on the basis of a single lithography step, followed by a sequence of two deposition processes, thereby resulting in a self-aligned mechanism for providing the most critical lateral dimensions for active regions. In this manner, the smallest pitch of approximately 80 nm and even less may be accomplished with superior device uniformity, while at the same time reducing overall manufacturing complexity.