The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2022

Filed:

Sep. 19, 2019
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Reinhard Ploss, Unterhaching, DE;

Thomas Aichinger, Faak am See, AT;

Roland Rupp, Lauf, DE;

Hans-Joachim Schulze, Taufkirchen, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 29/06 (2006.01); H01L 29/423 (2006.01); H01L 29/16 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1095 (2013.01); H01L 29/0696 (2013.01); H01L 29/1608 (2013.01); H01L 29/4236 (2013.01); H01L 29/66068 (2013.01);
Abstract

An embodiment of a semiconductor device includes a trench gate structure extending from a first surface into a silicon carbide semiconductor body along a vertical direction. A body region of a first conductivity type adjoins a sidewall of the trench gate structure and includes a first body sub-region adjoining the sidewall and a second body sub-region adjoining the sidewall. At least one profile of dopants of the first conductivity type along the vertical direction includes a first doping peak in the first body sub-region and a second doping peak in the second body sub-region. A doping concentration of the first doping peak is larger than a doping concentration of the second doping peak.


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