The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2022

Filed:

May. 26, 2017
Applicant:

Institute of Microelectronics, Chinese Academy of Sciences, Beijing, CN;

Inventors:

Hangbing Lv, Beijing, CN;

Ming Liu, Beijing, CN;

Shibing Long, Beijing, CN;

Qi Liu, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
H01L 45/1253 (2013.01); H01L 27/2436 (2013.01); H01L 27/2463 (2013.01); H01L 45/08 (2013.01); H01L 45/1233 (2013.01); H01L 45/146 (2013.01); H01L 45/1625 (2013.01); H01L 45/1633 (2013.01);
Abstract

A RRAM and a method for fabricating the same, wherein the RRAM comprises: a bottom electrode; an oxide layer containing a bottom electrode metal, disposed on the bottom electrode; a resistance-switching layer, disposed on the oxide layer containing a bottom electrode metal, wherein the resistance-switching layer material is a nitrogen-containing tantalum oxide; an inserting layer, disposed on the resistance-switching layer, wherein the inserting layer material comprises a metal or a semiconductor; a top electrode, disposed on the inserting layer. By providing the to resistance-switching layer with a nitrogen-containing tantalum oxide, compared with TaO, the RRAM of the present disclosure has a low activation voltage and a high on-off ratio, and can enhance the control capability over the device resistance by the number of oxygen vacancies.


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