The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2022
Filed:
Apr. 23, 2020
International Business Machines Corporation, Armonk, NY (US);
Koichi Motoyama, Clifton Park, NY (US);
Kenneth Chun Kuen Cheng, Albany, NY (US);
Chanro Park, Clifton Park, NY (US);
Chih-Chao Yang, Glenmont, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A dual damascene interconnect structure with a fully aligned via integration scheme is formed with a partially removed etch stop layer. Portions of the etch stop layer are removed prior to dual damascene patterning of an interlevel dielectric layer formed above metal lines and after such patterning. Segments of the etch stop layer remain only around the vias, allowing the overall capacitance of the structure to be reduced.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile