The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2022

Filed:

Jul. 03, 2019
Applicant:

Wolfspeed, Inc., Durham, NC (US);

Inventors:

Saptharishi Sriram, Cary, NC (US);

Yueying Liu, Morrisville, NC (US);

Assignee:

Wolfspeed, Inc., Durham, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/266 (2006.01); H01L 29/778 (2006.01); H01L 29/20 (2006.01); H01L 29/08 (2006.01); H01L 21/265 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 21/266 (2013.01); H01L 29/0843 (2013.01); H01L 29/2003 (2013.01); H01L 29/7786 (2013.01); H01L 21/26546 (2013.01); H01L 21/26586 (2013.01); H01L 29/41766 (2013.01); H01L 29/42316 (2013.01);
Abstract

A transistor device is provided. The transistor device includes a substrate, a channel layer on the substrate, the channel layer including a GaN material, a barrier layer that is on the channel layer and that includes an AlGaN material, a drain electrode that is on the barrier layer in a drain region of the device, a source ohmic structure that is at least partially recessed into the barrier layer in a source region of the device, a source electrode that is on the source ohmic structure and a gate contact that is on the barrier layer and that is in a gate region of the device that is between the drain region and the source region.


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