The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2022
Filed:
Jun. 02, 2020
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Abstract
The present disclosure discloses a semiconductor device, which comprises: an embedded gate structure with a bottom embedded in a semiconductor substrate; a channel region formed below the bottom surface of the embedded gate structure; a source region and a drain region formed on the two sides of the embedded gate structure; an embedded epitaxial layer formed in the source region or the drain region, the bottom surface of the embedded gate structure being in flush with the maximum stress position of the embedded epitaxial layer. The present disclosure further discloses a method for manufacturing a semiconductor device. The present disclosure can enable the channel region to be located in the maximum stress region of the embedded epitaxial layer, thereby improving the mobility of channel carriers to the utmost extent and improving the conduction current of the device.