The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2022

Filed:

Mar. 05, 2021
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventor:

Shifang Li, Pleasanton, CA (US);

Assignee:

KLA Corp., Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01); G01B 11/25 (2006.01); G01N 21/95 (2006.01); G01N 21/93 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8851 (2013.01); G01B 11/25 (2013.01); G01N 21/8806 (2013.01); G01N 21/93 (2013.01); G01N 21/95 (2013.01);
Abstract

Methods and systems for determining metrology-like information for a specimen using an inspection tool are provided. One method includes determining first process information for first feature(s) formed in first area(s) on a specimen from output generated by output acquisition subsystem(s) that include an inspection subsystem. The method also includes determining second process information for second feature(s) formed in second area(s) on the specimen from the output and at least a portion of the first process information. At least a portion of the second process information is a different type of information than the first process information. At least a portion of a design for the second feature(s) is different than a design for the first feature(s), and the first area(s) and the second area(s) are mutually exclusive on the specimen.


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