The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2022
Filed:
Feb. 05, 2021
Applicant:
Sigray, Inc., Concord, CA (US);
Inventors:
Wenbing Yun, Walnut Creek, CA (US);
Sylvia Jia Yun Lewis, San Francisco, CA (US);
Janos Kirz, Berkeley, CA (US);
Assignee:
Sigray, Inc., Concord, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01); G01N 23/20008 (2018.01); G01N 23/083 (2018.01); G01N 23/205 (2018.01);
U.S. Cl.
CPC ...
G21K 1/06 (2013.01); G01N 23/083 (2013.01); G01N 23/205 (2013.01); G01N 23/20008 (2013.01); G21K 1/062 (2013.01); G21K 1/067 (2013.01);
Abstract
An x-ray mirror optic includes a plurality of surface segments with quadric cross-sections having differing quadric parameters. The quadric cross-sections of the surface segments share a common axis and are configured to reflect x-rays in a plurality of reflections along a single optical axis or in a scattering plane defined as containing an incident x-ray and a corresponding reflected x-ray.