The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2021

Filed:

Aug. 26, 2019
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Ting-Ya Cheng, Hsinchu, TW;

Chun-Lin Chang, Zhubei, TW;

Li-Jui Chen, Hsinchu, TW;

Han-Lung Chang, Kaohsiung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G02B 7/185 (2021.01); G02B 26/06 (2006.01); G02B 26/08 (2006.01); G02B 27/09 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); G02B 7/185 (2013.01); G02B 26/06 (2013.01); G02B 26/0858 (2013.01); G02B 27/0933 (2013.01); G02B 27/0977 (2013.01); G03F 7/70033 (2013.01); H05G 2/005 (2013.01);
Abstract

An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.


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