The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2021
Filed:
Jan. 02, 2020
Carl Zeiss Microscopy Gmbh, Jena, DE;
Ingo Kleppe, Jena, DE;
Yauheni Novikau, Apolda, DE;
Carl Zeiss Microscopy GmbH, Jena, DE;
Abstract
A method for high-resolution scanning microscopy of a sample in which a sample is illuminated at a point in or on the sample by means of illumination radiation. The point is imaged along an optical axis and according to a point spread function into a diffraction image on a spatially resolving surface detector that comprises detector pixels in which a diffraction structure of the diffraction image is resolved. The point is displaced relative to the sample in at least two scanning directions and pixel signals are read from the detector pixels in various scanning posi- tions, wherein the pixel signals are respectively assigned to that scanning position at which they were read out and adjacent scanning positions overlap one another and are disposed according to a scanning increment. An image of the sample having a resolution that is increased beyond a resolution limit of the imaging is generated from the read pixel signals and the assigned scanning positions, wherein a deconvolution is carried out. Intermediate positions are generated for at least one of the scanning directions in the deconvolution on the basis of the pixel signals and the image of the sample, which contains more image points than scanning positions, is generated.