The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2021
Filed:
Mar. 13, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Ami Sade, Sunnyvale, CA (US);
Todd Egan, Fremont, CA (US);
Shay Assaf, Gilroy, CA (US);
Jacob Newman, Palo Alto, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/01 (2006.01); G01B 11/06 (2006.01); G01N 21/21 (2006.01); G01N 21/55 (2014.01);
U.S. Cl.
CPC ...
G01N 21/01 (2013.01); G01B 11/0625 (2013.01); G01B 11/0641 (2013.01); G01N 21/211 (2013.01); G01N 21/55 (2013.01); G01N 2021/0106 (2013.01);
Abstract
Full wafer in-situ metrology chambers and methods of use are described. The metrology chambers include a substrate support and a sensor bar that are rotatable relative to each other. The sensor bar includes a plurality of sensors at different radii from a central axis.