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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11195867 B1

PDFFull Text
Date of Patent:
Dec. 07, 2021

Filed:

Jul. 08, 2020

High dielectric constant dielectric layer forming method, image sensor device, and manufacturing method thereof

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Tsung-Han Tsai, Zhunan Township, TW;

Horng-Huei Tseng, Hsinchu, TW;

Chun-Hao Chou, Tainan, TW;

Kuo-Cheng Lee, Tainan, TW;

Yung-Lung Hsu, Tainan, TW;

Yun-Wei Cheng, Taipei, TW;

Hsin-Chieh Huang, Hsinchu, TW;

Assignee:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Attorney:

Slater Matsil, LLP

Primary Examiner:

Victor A Mandala

Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1462 (2013.01); H01L 21/0206 (2013.01); H01L 21/0228 (2013.01); H01L 21/02181 (2013.01); H01L 27/1464 (2013.01); H01L 27/14685 (2013.01); H01L 27/1463 (2013.01); H01L 27/14621 (2013.01); H01L 27/14636 (2013.01);
Abstract

A method for forming a high dielectric constant (high-κ) dielectric layer on a substrate including performing a pre-clean process on a surface of the substrate. A chloride precursor is introduced on the surface. An oxidant is introduced to the surface to form the high-κ dielectric layer on the substrate. A chlorine concentration of the high-κ dielectric layer is lower than about 8 atoms/cm.

Find Patent Forward Citations

Tsai, Tsung-Han. (2021). High dielectric constant dielectric layer forming method, image sensor device, and manufacturing method thereof (U.S. Patent No. 11195867). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11195867

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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