The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 2021

Filed:

Jul. 17, 2019
Applicant:

Atomera Incorporated, Los Gatos, CA (US);

Inventors:

Richard Burton, Phoenix, AZ (US);

Marek Hytha, Brookline, MA (US);

Robert J. Mears, Wellesley, MA (US);

Assignee:

ATOMERA INCORPORATED, Los Gatos, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 31/00 (2006.01); H01L 29/15 (2006.01); H01L 29/16 (2006.01); H01L 29/80 (2006.01); H01L 29/66 (2006.01); H01L 29/93 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/152 (2013.01); H01L 29/16 (2013.01); H01L 29/66174 (2013.01); H01L 29/66666 (2013.01); H01L 29/66916 (2013.01); H01L 29/7827 (2013.01); H01L 29/802 (2013.01); H01L 29/93 (2013.01);
Abstract

A semiconductor device may include a substrate and a hyper-abrupt junction region carried by the substrate. The hyper-abrupt region may include a first semiconductor layer having a first conductivity type, a first superlattice layer on the first semiconductor layer, a second semiconductor layer on the first superlattice layer and having a second conductivity type different than the first conductivity type, and a second superlattice layer on the second semiconductor layer. The semiconductor device may further include a gate dielectric layer on the second superlattice layer of the hyper-abrupt junction region, a gate electrode on the gate dielectric layer, and spaced apart source and drain regions adjacent the hyper-abrupt junction region.


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