The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Apr. 16, 2020
Axcelis Technologies, Inc., Beverly, MA (US);
Joshua Max Abeshaus, Salem, MA (US);
Neil Bassom, Hamilton, MA (US);
Camilla Lambert, Salisbury, MA (US);
Caleb Wisch, Stow, MA (US);
Kyle Hinds, Westfield, MA (US);
Caleb Bell, Woburn, MA (US);
AXCELIS TECHNOLOGIES, INC., Beverly, MA (US);
Abstract
An ion source for an ion implantation system has a plurality of arc chambers. The ion source forms an ion beam from a respective one of the plurality of arc chambers based on a position of the respective one of the plurality of arc chambers with respect to a beamline. The arc chambers are coupled to a carrousel that translates or rotates the respective one of the plurality of arc chambers to a beamline position associated with the beamline. One or more of the plurality of arc chambers can have at least one unique feature, or two or more of the plurality of arc chambers can be generally identical to one another.