The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2021

Filed:

Nov. 03, 2016
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21G 1/10 (2006.01); G21G 1/12 (2006.01); H05H 7/08 (2006.01); H01S 3/09 (2006.01); G02B 27/10 (2006.01); G21K 5/00 (2006.01); G21K 5/04 (2006.01); G21K 1/08 (2006.01); G21K 1/093 (2006.01); G21G 1/00 (2006.01);
U.S. Cl.
CPC ...
G21G 1/10 (2013.01); G21G 1/12 (2013.01); G02B 27/10 (2013.01); G21G 2001/0042 (2013.01); G21K 1/08 (2013.01); G21K 1/093 (2013.01); G21K 5/00 (2013.01); G21K 5/04 (2013.01); G21K 2201/065 (2013.01); H01S 3/0903 (2013.01); H05H 2007/084 (2013.01); H05H 2242/10 (2013.01);
Abstract

A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector () and an electron accelerator (). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target () and a beam splitter () arranged to direct the a first portion of the electron beam along a first path towards a first side of the target () and to direct a second portion of the electron beam along a second path towards a second side of the target ().


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