The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2021
Filed:
Aug. 22, 2019
Applicant:
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Inventors:
Yung-Yao Lee, Hsinchu County, TW;
Chen Yi Hsu, Hsinchu County, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); G03F 7/004 (2006.01); H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); G03F 7/30 (2006.01); B05D 1/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01); G03F 7/004 (2013.01); G03F 7/3028 (2013.01); H01L 21/0273 (2013.01); H01L 21/02282 (2013.01); H01L 21/6715 (2013.01); B05D 1/005 (2013.01);
Abstract
The present disclosure provides a method for forming a masking layer, including spinning a wafer, dispensing a first liquid at a first location on the wafer, and dispensing a second liquid at a second location on the wafer simultaneously with dispensing the first liquid at the first location, wherein the second liquid is a remover of the first liquid, and the first location is different from the second location.