The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2021
Filed:
Oct. 03, 2016
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Tomohito Matsuo, Yamanashi, JP;
Hiroshi Nagaike, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/44 (2006.01); H01L 21/3213 (2006.01); H01L 21/3065 (2006.01); C23G 5/00 (2006.01); C23F 4/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32862 (2013.01); C23C 16/4401 (2013.01); C23C 16/4405 (2013.01); C23C 16/4408 (2013.01); C23F 4/00 (2013.01); C23G 5/00 (2013.01); H01J 37/3244 (2013.01); H01J 37/3288 (2013.01); H01J 37/32449 (2013.01); H01J 37/32834 (2013.01); H01L 21/3065 (2013.01); H01L 21/32135 (2013.01); H01L 21/32136 (2013.01); H01L 21/67069 (2013.01); H01J 2237/022 (2013.01);
Abstract
A processing apparatus performs a predetermined process on an object to be processed by supplying halogen-based gas into a chamber in which a vacuum is maintained, to which chamber a member having an oxide film formed on a surface thereof is connected, or which chamber has an oxide film formed on a surface thereof, wherein the predetermined processing is performed on the target object once or a plurality of times in the chamber. Later, oxygen gas or dry air is supplied to the chamber to purge the chamber, and then the chamber is opened and exposed to the atmosphere.