The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2021

Filed:

Apr. 01, 2016
Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Rikimaru Sakamoto, Toyama, JP;

Takafumi Endo, Toyama, JP;

Tadashi Hatanaka, Funabashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 3/24 (2006.01); C09D 163/00 (2006.01); G03F 7/09 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); C08F 299/02 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
C08J 3/24 (2013.01); C08F 299/02 (2013.01); C09D 163/00 (2013.01); G03F 7/038 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); C08L 2312/06 (2013.01);
Abstract

There is provided a composition for coating a stepped substrate that has high filling properties of a pattern, and is capable of forming a coating film that does not cause degassing and heat shrinkage, and is used to form a coating film having flattening properties on the substrate. The composition for coating a stepped substrate includes a compound (C) having in the molecule a partial structure of Formula (1) (where R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group, or a C6-40 aryl group; five R3s are each independently a hydrogen atom, a hydroxy group, a C1-10 alkoxy group, a C1-10 alkyl group, a nitro group, or a halogen atom; and * is a bond site to the compound); and a solvent.


Find Patent Forward Citations

Loading…