The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Aug. 19, 2019
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Paolo Fantini, Vimercate, IT;

F. Daniel Gealy, Kuna, ID (US);

Enrico Varesi, Milan, IT;

Swapnil A. Lengade, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/24 (2006.01); C01B 19/00 (2006.01); C01B 35/14 (2006.01); G11C 11/22 (2006.01); G11C 13/00 (2006.01); H01L 27/11507 (2017.01); H01L 27/11514 (2017.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
H01L 27/2427 (2013.01); C01B 19/007 (2013.01); C01B 35/14 (2013.01); G11C 11/22 (2013.01); G11C 13/0004 (2013.01); H01L 27/11507 (2013.01); H01L 27/11514 (2013.01); H01L 45/04 (2013.01); H01L 45/06 (2013.01); H01L 45/1233 (2013.01); H01L 45/143 (2013.01); G11C 2213/71 (2013.01); G11C 2213/73 (2013.01); H01L 27/2481 (2013.01);
Abstract

Systems, devices, and methods related to or that employ chalcogenide memory components and compositions are described. A memory device, such as a selector device, may be made of a chalcogenide material composition. A chalcogenide material may have a composition that includes one or more elements from the boron group, such as boron, aluminum, gallium, indium, or thallium. A selector device, for instance, may have a composition of selenium, arsenic, and at least one of boron, aluminum, gallium, indium, or thallium. The selector device may also be composed of germanium or silicon, or both. The relative amount of boron, aluminum, gallium, indium, or thallium may affect a threshold voltage of a memory component, and the relative amount may be selected accordingly. A memory component may, for instance have a composition that includes selenium, arsenic, and some combination of germanium, silicon, and at least one of boron, aluminum, gallium, indium, or thallium.


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