The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Jul. 03, 2020
Applicant:

Sigray, Inc., Concord, CA (US);

Inventors:

Janos Kirz, Berkeley, CA (US);

William Henry Hansen, Genola, UT (US);

Wenbing Yun, Walnut Creek, CA (US);

Assignee:

Sigray, Inc., Concord, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/18 (2006.01); H01J 35/10 (2006.01); H01J 35/20 (2006.01);
U.S. Cl.
CPC ...
H01J 35/18 (2013.01); H01J 35/106 (2013.01); H01J 35/20 (2013.01); H01J 35/1017 (2019.05); H01J 2235/1204 (2013.01); H01J 2235/127 (2013.01);
Abstract

An x-ray source includes an anode assembly having at least one surface configured to rotate about an axis, the at least one surface in a first region. The x-ray source further includes an electron-beam source configured to emit at least one electron beam configured to bombard the at least one surface of the anode assembly. The electron-beam source includes a housing, a cathode assembly, and a window. The housing at least partially bounds a second region and comprises an aperture. The cathode assembly is configured to generate the at least one electron beam within the second region. The window is configured to hermetically seal the aperture, to maintain a pressure differential between the first region and the second region, and to allow the at least one electron beam to propagate from the second region to the first region.


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