The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2021

Filed:

Jan. 06, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Keiichi Nagakubo, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0071 (2013.01); H01L 21/6719 (2013.01); H01L 21/67109 (2013.01); H01L 21/67173 (2013.01); H01L 21/67207 (2013.01); H01L 21/67248 (2013.01); H01L 21/67742 (2013.01); H01L 21/67748 (2013.01);
Abstract

A substrate processing system comprising: a heat treatment chamber configured to sublimate by-products by heat; and a substrate carrier configured to load a substrate into the heat treatment chamber, the substrate carrier including a holder for holding the substrate, and a controller configured to control operations of the heat treatment chamber, the substrate carrier, and the holder, wherein the controller is programmed to control the sublimation to, (a) maintain a temperature of the holding unit at a level equal to or higher than a predetermined temperature, while (b) inhibiting thermal damage to the substrate transfer mechanism excluding the holding unit.


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