The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
Feb. 05, 2020
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
Atanu K. Das, Danbury, CT (US);
Michael White, Ridgefield, CT (US);
Daniela White, Ridgefield, CT (US);
Assignee:
ENTEGRIS, INC., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 3/36 (2006.01); C11D 1/90 (2006.01); C11D 3/20 (2006.01); C11D 3/33 (2006.01);
U.S. Cl.
CPC ...
C11D 3/364 (2013.01); C11D 1/90 (2013.01); C11D 3/2082 (2013.01); C11D 3/33 (2013.01); C11D 3/362 (2013.01);
Abstract
The present invention generally relates to a removal composition and process, particularly useful for cleaning ceria particles and CMP contaminants from microelectronic devices having said particles and CMP contaminants thereon, in particular microelectronic devices having PETEOS, Silicon Nitride, and Poly-Si substrates. In one aspect, the invention provides treatment of the microelectronic substrate having ceria particles thereon utilizing complexing agents free of Sulfur and Phosphorous atoms.