The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Sep. 17, 2019
Asml Netherlands B.v., Veldhoven, NL;
Adriaan Johan Van Leest, Eindhoven, NL;
Anagnostis Tsiatmas, Eindhoven, NL;
Paul Christiaan Hinnen, Veldhoven, NL;
Elliott Gerard McNamara, Eindhoven, NL;
Alok Verma, Eindhoven, NL;
Thomas Theeuwes, Veldhoven, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.