The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Sep. 13, 2019
Carl Zeiss Microscopy Gmbh, Jena, DE;
Jörg Fober, Heuchlingen, DE;
Judith Kimling, Aalen, DE;
Wolfgang Berger, Gerstetten, DE;
Stefan Meyer, Aalen, DE;
Björn Gamm, Koenigsbronn, DE;
Carl Zeiss Microscopy GmbH, Jena, DE;
Abstract
A particle beam system is configured to perform a method which includes: preventing at least one of generation of induced particles and incidence of the induced particles onto a detection area of a detector configured to output a detection signal; generating a residual signal by processing the detection signal outputted during the preventing using a control value; adjusting, based on the residual signal, the control value so that the residual signal takes a value within a predetermined limited residual-signal target range; directing a primary particle beam onto an object while allowing generation of the induced particles due to the primary particle beam and incidence of the induced particles onto the detection area; generating a result signal by processing the detection signal outputted during the directing using the control value.