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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11081408 B1

PDFFull Text
Date of Patent:
Aug. 03, 2021

Filed:

Jan. 08, 2020

Methods for wafer warpage control

Applicant:

Yangtze Memory Technologies Co., Ltd., Wuhan, CN;

Inventors:

Dandan Shi, Wuhan, CN;

Ming Hu, Wuhan, CN;

Shijin Luo, Wuhan, CN;

Zhiliang Xia, Wuhan, CN;

Zhi Zhang, Wuhan, CN;

Assignee:

YANGTZE MEMORY TECHNOLOGIES CO., LTD., Wuhan, CN;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Seahvosh Nikmanesh

Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/02 (2006.01); H01L 29/66 (2006.01); H01L 29/10 (2006.01); H01L 27/11582 (2017.01); H01L 27/11556 (2017.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); H01L 21/02532 (2013.01); H01L 21/02595 (2013.01); H01L 29/1037 (2013.01); H01L 29/66545 (2013.01); H01L 27/11556 (2013.01); H01L 27/11582 (2013.01);
Abstract

Aspects of the disclosure provide a method for wafer warpage control. The method includes forming a filling structure in a slit opening on a wafer. Further, the method includes measuring a warpage parameter of the wafer, and determining a thermal profile to adjust a warpage parameter into a target range based on the warpage parameter. Then, the method includes performing a process having the determined thermal profile to adjust the warpage parameter into the target range.

Find Patent Forward Citations

Shi, Dandan. (2021). Methods for wafer warpage control (U.S. Patent No. 11081408). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11081408

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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