The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2021

Filed:

Mar. 12, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Shih Wei Bih, Taichung, TW;

Yen-Yu Chen, Taichung, TW;

Yi-Ming Dai, Hsinchu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02266 (2013.01); C23C 14/3407 (2013.01); C23C 14/35 (2013.01); C23C 14/54 (2013.01); H01L 21/02186 (2013.01);
Abstract

The present disclosure provides an apparatus for fabricating a semiconductor device with target sputtering, including a chamber for accommodating a consumable target, a target accumulative consumption counter, wherein the target accumulative consumption counter provides a signal correlated to an amount of the consumable target being consumed, and a power supply communicates with the consumable target counter, wherein the power supply provides a power output according to the signal.


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Bih, Shih. (2021). Apparatus for fabricating a semiconductor device with target sputtering and target sputtering method for fabricating the semiconductor device (U.S. Patent No. 11081341). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11081341

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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