The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2021
Filed:
Sep. 06, 2019
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Jens Oster, Ober-Ramstadt, DE;
Markus Waiblinger, Darmstadt, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/74 (2012.01); G03F 1/36 (2012.01); G03F 1/72 (2012.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G03F 1/74 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 1/72 (2013.01);
Abstract
The present invention relates to a method for ascertaining a repair shape for processing at least one defect of a photolithographic mask including the following steps: (a) determining at least one correction value for the repair shape of the at least one defect, wherein the correction value takes account of a position of at least one pattern element of the photolithographic mask, said at least one pattern element not contacting the at least one defect; and (b) correcting the repair shape by applying the at least one correction value.