The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2021

Filed:

Nov. 06, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Tung-Heng Hsieh, Zhudong Town, TW;

Ting-Wei Chiang, New Taipei, TW;

Chung-Te Lin, Tainan, TW;

Hui-Zhong Zhuang, Tainan, TW;

Li-Chun Tien, Tainan, TW;

Sheng-Hsiung Wang, Zhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01); H01L 23/535 (2006.01); H01L 27/088 (2006.01); H01L 29/40 (2006.01); H01L 21/768 (2006.01); H01L 21/8234 (2006.01); H01L 23/485 (2006.01);
U.S. Cl.
CPC ...
H01L 23/528 (2013.01); H01L 21/76895 (2013.01); H01L 21/76897 (2013.01); H01L 21/823475 (2013.01); H01L 23/485 (2013.01); H01L 23/535 (2013.01); H01L 27/088 (2013.01); H01L 29/401 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A semiconductor device includes a substrate having an active region, a first gate structure over a top surface of the substrate, a second gate structure over the top surface of the substrate, a pair of first spacers on each sidewall of the first gate structure, a pair of second spacers on each sidewall of the second gate structure, an insulating layer over at least the first gate structure, a first conductive feature over the active region and a second conductive feature over the substrate. Further, the second gate structure is adjacent to the first gate structure and a top surface of the first conductive feature is coplanar with a top surface of the second conductive feature.


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