The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2021
Filed:
Jan. 13, 2020
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 47/12 (2006.01); B24B 37/005 (2012.01); B24B 37/10 (2012.01); H01L 21/321 (2006.01); H02P 29/00 (2016.01); B24B 37/04 (2012.01); H01L 21/306 (2006.01); B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
B24B 47/12 (2013.01); B24B 1/00 (2013.01); B24B 37/005 (2013.01); B24B 37/044 (2013.01); B24B 37/10 (2013.01); H01L 21/30625 (2013.01); H01L 21/3212 (2013.01); H02P 29/00 (2013.01);
Abstract
A method of controlling platen rotation includes receiving an electrical energy input at a rotator assembly, using the rotator assembly to increase a rotational kinetic energy of a platen based on the electrical energy input, using the rotator assembly to decrease the rotational kinetic energy of the platen, and generating an electrical energy output of the rotator assembly based on the decreased rotational kinetic energy of the platen.