The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Oct. 11, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Oscar van der Straten, Guilderland Center, NY (US);

Koichi Motoyama, Clifton Park, NY (US);

Joseph F. Maniscalco, Lake Katrine, NY (US);

Scott DeVries, Albany, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/52 (2006.01); H01L 23/528 (2006.01); H01L 23/532 (2006.01); H01L 23/48 (2006.01); H01L 21/768 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76844 (2013.01); H01L 21/2855 (2013.01); H01L 21/28562 (2013.01); H01L 21/7685 (2013.01); H01L 21/76814 (2013.01); H01L 21/76846 (2013.01); H01L 2224/05006 (2013.01); H01L 2224/05546 (2013.01);
Abstract

Devices and methods that can facilitate hybrid sidewall barrier and low resistance interconnect components are provided. According to an embodiment, a device can comprise a first interconnect material layer that can have a first opening that can comprise a first discontinuous barrier liner coupled to first sidewalls of the first opening and a first continuous barrier layer coupled to the first discontinuous barrier liner and the first sidewalls. The device can further comprise a second interconnect material layer coupled to the first interconnect material layer, the second interconnect material layer can have a second opening that can comprise a second discontinuous barrier liner coupled to second sidewalls of the second opening, a second continuous barrier layer coupled to the second discontinuous barrier liner and the second sidewalls.


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