The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2021

Filed:

Dec. 12, 2016
Applicant:

Siltectra Gmbh, Dresden, DE;

Inventors:

Ralf Rieske, Dresden, DE;

Christian Beyer, Freiberg, DE;

Christoph Guenther, Dresden, DE;

Jan Richter, Dresden, DE;

Marko Swoboda, Dresden, DE;

Assignee:

Siltectra GmbH, Dresden, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/03 (2006.01); B23K 26/36 (2014.01); B23K 26/40 (2014.01); B28D 5/00 (2006.01); B23K 103/16 (2006.01);
U.S. Cl.
CPC ...
B28D 5/0011 (2013.01); B23K 26/36 (2013.01); B23K 2103/166 (2018.08);
Abstract

A method for creating modifications in a solid-state material is described, wherein a crack guidance region for guiding a crack for separating a solid-state layer from the solid-state material is predetermined by the modifications. The method includes: moving the solid-state material relative to a laser processing system; successively emitting a plurality of laser beams from the laser processing system to the solid-state material to create at least one modification within the solid-state material; and continuously adjusting the laser processing system for defined focusing of the plurality of laser beams and/or for adjustment of energy of the plurality of laser beams as a function of at least one parameter.


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