The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Nov. 01, 2017
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Hom-Chung Lin, Taichung, TW;

Jih-Churng Twu, Hsinchu County, TW;

Chin-Yun Chen, Taipei, TW;

Tai-Hsiang Lin, Taichung, TW;

Yu-Chi Tsai, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/677 (2006.01); G01N 27/22 (2006.01); G08B 21/18 (2006.01); G08B 25/10 (2006.01); G08B 21/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67276 (2013.01); G01N 27/223 (2013.01); G08B 21/182 (2013.01); G08B 21/20 (2013.01); G08B 25/10 (2013.01); H01L 21/67253 (2013.01); H01L 21/67288 (2013.01); H01L 21/67733 (2013.01); H01L 21/67757 (2013.01); H01L 21/67778 (2013.01);
Abstract

A method for fault detection in a fabrication tool is provided. The method includes processing a semiconductor wafer in a fabrication tool according to a plurality of process events of a process run. The method further includes measuring humidity in the fabrication tool in at least one of the process events. The method also includes comparing the humidity measured in one of the process events with an expected humidity associated with the process event. In addition, the method includes based on the comparison, indicating an alarm condition when a difference between the measured humidity and the expected humidity exceeds a range of acceptable values associated with the process event.


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