The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2021

Filed:

Mar. 06, 2019
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Chang Soo Suh, Allen, TX (US);

Sameer Prakash Pendharkar, Allen, TX (US);

Naveen Tipirneni, Frisco, TX (US);

Jungwoo Joh, Allen, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/872 (2006.01); H01L 29/205 (2006.01); H01L 29/778 (2006.01); H01L 29/66 (2006.01); H01L 29/20 (2006.01); H01L 29/423 (2006.01); H01L 21/308 (2006.01); H01L 29/417 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/778 (2013.01); H01L 21/0254 (2013.01); H01L 21/308 (2013.01); H01L 29/2003 (2013.01); H01L 29/41725 (2013.01); H01L 29/42312 (2013.01); H01L 29/66462 (2013.01);
Abstract

In some examples, a gallium nitride (GaN)-based transistor, comprises a substrate; a GaN layer supported by the substrate; an aluminum nitride gallium (AlGaN) layer supported by the GaN layer; a p-doped GaN structure supported by the AlGaN layer; and multiple p-doped GaN blocks supported by the AlGaN layer, each of the multiple p-doped GaN blocks physically separated from the remaining multiple p-doped GaN blocks, wherein first and second contours of a two-dimensional electron gas (2DEG) of the GaN-based transistor are at an interface of the AlGaN and GaN layers.


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