The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2021
Filed:
Dec. 21, 2017
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Bon-Woong Koo, Andover, MA (US);
Robert C. Lindberg, Rockport, MA (US);
Eric D. Hermanson, Georgetown, MA (US);
Frank Sinclair, Boston, MA (US);
Antonella Cucchetti, Manchester by the Sea, MA (US);
Randy Martin, Haverhill, MA (US);
Michael D. Johnson, Peabody, MA (US);
Ana Samolov, Somerville, MA (US);
Svetlana B. Radovanov, Brookline, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a mass resolving apparatus having a resolving aperture, in which the resolving aperture may be moved in the X and Z directions. Additionally, a controller is able to manipulate the mass analyzer and quadrupole lenses so that the crossover point of desired ions can also be moved in the X and Z directions. By manipulating the crossover point and the resolving aperture, the parameters of the ribbon ion beam may be manipulated to achieve a desired result. Movement of the crossover point in the X direction may affect the mean horizontal angle of the beamlets, while movement of the crossover point in the Z direction may affect the horizontal angular spread and beam current.