The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2021
Filed:
Aug. 06, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Yang Yang, San Diego, CA (US);
Eswaranand Venkatasubramanian, Santa Clara, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Steven Lane, Porterville, CA (US);
Gonzalo Monroy, San Francisco, CA (US);
Lucy Zhiping Chen, Santa Clara, CA (US);
Yue Guo, Redwood City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of forming a transparent carbon layer on a substrate is provided. The method comprises generating an electron beam plasma above a surface of a substrate positioned over a first electrode and disposed in a processing chamber having a second electrode positioned above the first electrode. The method further comprises flowing a hydrocarbon-containing gas mixture into the processing chamber, wherein the second electrode has a surface containing a secondary electron emission material selected from a silicon-containing material and a carbon-containing material. The method further comprises applying a first RF power to at least one of the first electrode and the second electrode and forming a transparent carbon layer on the surface of the substrate.